UROP Openings

Have a UROP opening you would like to submit?

Please fill out the form.

Submit your UROP opening

Data analysis of deposition of superconducting films


Term:

Fall

Department:

RLE: Research Lab for Electronics

Faculty Supervisor:

Karl K Berggren

Faculty email:

berggren@mit.edu

Apply by:

09/09/20

Contact:

Ilya Charaev, charaev@mit.edu

Project Description

The stability and reproducibility of the reactive magnetron sputtering process play a significant role in the performance of superconducting nanoscale devices. The variation of parameters including gas flow, pressure, and power produces intrinsic defects in films that restrict ultimate metrics of detectors and make them worse. The goal of the project is the systematical study of the reactive magnetron sputtering process and its correlation with electrical, superconducting, and optical properties of thin films. By sorting the data obtained in the last years and building analytical models, established trends will indicate the perspective for improving the process quality and stability over time.

Pre-requisites

None