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Data analysis of deposition of superconducting films
RLE: Research Lab for Electronics
Karl K Berggren
Ilya Charaev, email@example.com
The stability and reproducibility of the reactive magnetron sputtering process play a significant role in the performance of superconducting nanoscale devices. The variation of parameters including gas flow, pressure, and power produces intrinsic defects in films that restrict ultimate metrics of detectors and make them worse. The goal of the project is the systematical study of the reactive magnetron sputtering process and its correlation with electrical, superconducting, and optical properties of thin films. By sorting the data obtained in the last years and building analytical models, established trends will indicate the perspective for improving the process quality and stability over time.